This is the society's highest award, which recognizes "brilliance and originality of intellect, combined with vision extending beyond the boundaries of conventional scientific disciplines." Marks joins Northwestern colleague Julia Weertman, professor emeritus of materials science and engineering, who received the award in 2003.
Marks is a world leader in the fields of organometallic chemistry, chemical catalysis, materials science, organic electronics, photovoltaics and nanotechnology. His citation for the Von Hippel Award reads: "Consistently discovering and applying new scientific principles, Tobin Marks has advanced materials science across a spectrum from self-assembly to crystal growth, encompassing organic electronic, photonic and photovoltaic materials, and oxide dielectrics, conductors and superconductors."
Marks will receive this prestigious award Dec. 2 at the 2009 MRS Fall Meeting in Boston. He will deliver a lecture at the ceremony.
During his career, Marks has received numerous awards, including some of the most prestigious national and international awards in the fields of inorganic, catalytic, materials and organometallic chemistry. Recent honors include the 2010 Nichols Medal from the American Chemical Society, the 2009 Nelson W. Taylor Award from the Pennsylvania State University, the 2009 Herman Pines Award from the Chicago Catalysis Society, the 2008 Principe de Asturias Prize for Technical and Scientific Research and the U.S. National Medal of Science. He was named a 2009 Fellow of the Materials Research Society.
Marks has authored 940 articles in peer-reviewed journals and edited six books. He holds 93 U.S. patents. He has served on numerous scientific committees, governmental and industrial advisory boards and review panels and is co-author of several major policy documents. Marks has mentored more than 100 doctoral students and nearly as many postdoctoral fellows, with more than 90 alumni holding academic positions worldwide.